Regensburg 2000 – scientific programme
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VA: Vakuumphysik und Vakuumtechnik
VA 6: Ausgasung und Oberfl
ächen
VA 6.3: Talk
Tuesday, March 28, 2000, 15:40–16:00, H\"orsaal 47
Investigation of an in-situ cleaning method for UHV surfaces using free radicals — •Georg Vorlaufer1, Noël Hilleret1, and Herbert Störi2 — 1CERN, LHC Division, 1211 Geneva, Switzerland — 2TU Wien, Institut für Allgemeine Physik, 1040 Wien, Austria
The cleaning of vacuum chamber walls is a very important step to obtain UHV conditions in a vacuum system. Well established methods like in-situ bake out or glow discharge cleaning exist, but are sometimes difficult to carry out in large systems. In order to evaluate alternative solutions, the effectiveness of free radicals for the in-situ cleaning of UHV systems is being studied.
The radicals are produced by an industrial type microwave plasma generator and pumped through a vacuum chamber where they can recombine on the surface and form volatile reaction products with surface contaminants.
First experiments performed in order to quantify the effectiveness of this cleaning procedure will be described and first experimental results will be presented.