Aachen PK 2003 – wissenschaftliches Programm
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P: Plasmaphysik
P 17: Poster III
P 17.39: Poster
Donnerstag, 20. März 2003, 17:30–19:15, Foyer
Non-thermal plasmas as a sterilization- and coating technique for surfaces — •Christian Schrader1, Lutz Baars-Hibbe1, Philipp Sichler2, Karl-Heinz Gericke 1, and Stephanus Büttgenbach2 — 1Institut für Physikalische und Theoretische Chemie, Technische Universität Braunschweig, Hans-Sommer-Strasse 10, D-38106 Braunschweig, Germany — 2Institut für Mikrotechnik, Technische Universität Braunschweig, Alte Salzdahlumer Str. 203, D-38124 Braunschweig, Germany
A non-thermal plasma source (13.56MHz)which can be operated in a wide pressure range applying only moderate voltages is presented. It was used for deactivation of bacterial- and fungus spores on surfaces and for the deposition of SiO2-films with only minor techn. modifications. The success of the plasma induced processes is a function of many parameters. The importance of these parameters will be discussed in some detail.
We successfully sterilized 106 spores of the bacteria B. cereus at 1000mbar in Helium and the same quantity of spores of the fungus A. niger in Ar. These spores serve as a reference for the total deactivation by established methods like the treatment with H2O2-solution respectively UV-radiation. To make the reactive particles of the plasma bridge the gap of 2mm between the plasma source and the substrate inoculated by 0,05ml of the probe suspension we used an acceleration potential.
We also explored successfully the possibility to deposit SiO2 layers at 100mbar with tetraethoxysilane (TEOS) as monomer. The obained plasma polymerized films were characterized by STM, ellipsometry and gas-phase mass spectrometry