DS 20: Schichteigenschaften
Thursday, March 27, 2003, 10:15–11:00, GER/38
 |
10:15 |
DS 20.1 |
Diffusion phenomena in ultrathin Ta-based barrier layers for Cu metallization — •René Hübner, Michael Hecker, Norbert Mattern, and Klaus Wetzig
|
|
|
|
10:30 |
DS 20.2 |
Thermal stability of sputtered titanium oxynitride films — •Sodky Hamed Mohamed, Oliver Kappertz, Tim Niemeier, Robert Drese, and Matthias Wuttig
|
|
|
|
10:45 |
DS 20.3 |
XPS-Untersuchungen dünner PLD-PrxOy-Schichten auf Si(100) — •Markus Ratzke, Dirk Wolfframm, Mathias Kappa, M.J. Montenegro, M. Döbeli, Thomas Lippert und Jürgen Reif
|
|
|
