Dresden 2003 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Poster
DS 24.23: Poster
Dienstag, 25. März 2003, 14:30–17:00, P2a
Structural and optical characterisation of quartz-deposited amorphous SiC:H- thin films grown by precursor pyrolysis. — •O. Sciurova1, J.R. Niklas1, A. Hilbig2, E. Müller2, R. Wenzel3, K. Trommer3, and G. Roewer3 — 1Institute of Experimental Physics, University Bergakademie Freiberg, Germany — 2Institute of Ceramic Materials, University Bergakademie Freiberg, Germany — 3Institute of Inorganic Chemistry, University Bergakademie Freiberg, Germany
Thin layers of amorphous SiC:H were quartz-deposited by pyrolysis of a synthesised low-viscosity polymer, an oligomer (chlorovinylsilane). To obtain homogenous layers with a thickness smaller than 1 mkm the oligomers were diluted in CH2Cl2 or in toluene. The characteristics of the composition and structure of amorphous SiC-layers were examined by FTIR, XPS, WDS and EDS measurements. A hydrogen-stabilisation of the amorphous structure of the films is suggested. Optical absorption measurements showed significant variation in Eopt within the sample range, from 1.6 eV up to about 2.2 eV. From EPR measurements of pyrolysis amorphous SiC quartz-deposited films the spin-density (density of dangling bonds) was estimated to equal 1019 - 1020 spin/cm3, which corresponds to the value for conventionally deposited amorphous SiC films.