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DS: Dünne Schichten

DS 22: Postersitzung

DS 22.16: Poster

Dienstag, 9. März 2004, 14:30–17:00, Poster B

Non-conventional plasma sheath diagnostics for thin film deposition — •Holger Kersten¹, Ruben Wiese², and Marcel Haehnel² — ¹INP Greifswald, F.-L.-Jahn-Str.19, D-17489 Greifswald — ²University of Greifswald, Department of Physics, Domstr.10a, D-17487 Greifswald

Plasma and sheath diagnostics of sources used in thin film deposition is an essential issue for optimization and improvement of the related processes (sputtering, PECVD etc.). Often, complicated and expensive diagnostic methods (as mass spectrometry, spectroscopy, Langmuir probes etc.) have to be employed.

However, in certain cases these methods may be completed by relatively simple methods which can reveal information on the densities, energies and fluxes of the involved species, too. Such non-conventional methods are : energy flux measurements by thermal probes, analytical sheath photometry, and sheath diagnostics by charged micro-particles. These procedures will be reviewed and their advantages, but also their disadvantages and limits will be summarized.