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HL: Halbleiterphysik

HL 12: Poster I

HL 12.55: Poster

Montag, 8. März 2004, 16:30–19:00, Poster A

Regular silicon nano-pillars with high aspect ratios etched via self-organizing nano-porous polymer masks — •Andreas Ladenburger¹, Anton Reiser¹, Feng Yan², Johannes Konle¹, Werner A. Goedel², Rolf Sauer¹, and Klaus Thonke¹ — ¹Abt. Halbleiterphysik, Universität Ulm, D-89069 Ulm — ²Abt. Organische Chemie III, Universität Ulm, D-89069 Ulm

We have produced regular silicon pillars with high aspect ratios on the nanometer scale. In the process, first a nano-porous membrane defined by the imprints of self-organizing colloidal particles was created on a silicon wafer. Due to the self-organization the nano-pores form an array with hexagonal ordering. Then a gold film was deposited on the structure and the polymer membrane was removed. The remaining regular pattern of gold disks was used as a mask in a deep reactive ion etching process. The produced nano-pillars are 1.4 µm high and they have diameters less than 200 nm. As a by-product in the creation of the gold mask we obtained a regular gold grid, which can be applied as an optical short pass filter.