Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Poster presentation
DS 24.2: Poster
Dienstag, 28. März 2006, 15:00–17:30, P2
Self-Organized Surface Patterning — •Michael Hirtz1,2, Xiaodong Chen1,2, Harald Fuchs1,2, and Lifeng Chi1,2 — 1Physikalisches Institut WWU Münster, Wilhelm-Klemm-Straße 10, 48149 Münster — 2CeNTech, Gievenbecker Weg 11, 48149 Münster
Surface patterning is of great importance in modern science and technology. Patterning is usually achieved by top-down strategies, such as optical and e-beam lithography, soft-lithography, scanning probe lithography, and nanoimprint lithography. In contrast, the concepts of self-assembly and self-organization provide another interesting route toward the formation of patterned structures via a bottom-up approach. Here, we present the formation of regular striped patterns in a self-organized manner by means of Langmuir-Blodgett (LB) technique, and their applications.