Regensburg 2007 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 15: Poster Session
DS 15.3: Poster
Dienstag, 27. März 2007, 15:00–17:00, Poster B
IR mapping ellipsometry of ultrathin organic films on metallic and semiconducting substrates — •Dana Maria Rosu1, Michael Gensch3, Karen Kavanagh4, Wenjie Li4, Julia Hsu5, Norbert Esser1, Ullrich Schade2, and Karsten Hinrichs1 — 1ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str. 9, 12589 Berlin, Germany — 2Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH, Albert-Einstein-Str. 15, 12589 Berlin, Germany — 3DESY - Deutsches Elektronen-Synchrotron, Notkestr. 85, 22607 Hamburg, Germany — 4Kavanagh Lab, Dept. of Physics, Simon Fraser University, 8888 University Dr., Burnaby, BC, V5A 1S6, Canada — 5Sandia National Laboratories, Albuquerque, New Mexico 87185- 1120
An infrared spectroscopic ellipsometer is used for analysis of organic films on metals or semiconducting substrates. Monolayer sensitivity is achieved and lateral resolution was improved by utilizing the synchrotron mapping ellipsometer at BESSY II. IR synchrotron ellipsometry enables investigation of sample areas from 0.0625 mm2 to 1 mm2. The organic compound is identified by specific vibrational bands. Evaluation of measured spectra with optical models gives information about coverage and molecular orientation.