Dresden 2009 –
wissenschaftliches Programm
O 63: Semiconductor substrates: Adsorption
Freitag, 27. März 2009, 11:15–13:00, SCH A118
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11:15 |
O 63.1 |
Magnetic Molecules on GaN Studied by Low Temperature STM — •Kendal Clark, Danda Acharya, Violeta Iancu, Erdung Lu, Arthur Smith, and Saw-Wai Hla
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11:30 |
O 63.2 |
Self assembled organic monolayers on silicon carbide — •Marco Hoeb, Ian D. Sharp, Carlos A. Diaz Alvarez, Sebastian Schoell, Martin Stutzmann, and Martin S. Brandt
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11:45 |
O 63.3 |
Long-lived excitonic desorption of NO from C60/Cu(111) — Tim Hoger and •Helmut Zacharias
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12:00 |
O 63.4 |
STM study of the adsorption of coronene on Si(111)-(7x7) — •Jesus Martinez-Blanco, Max Klingsporn, and Karsten Horn
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12:15 |
O 63.5 |
Site-selective reactivity of ethylene on hydrogen pre-covered Si(001) — •Gerson Mette, Michael Dürr, and Ulrich Höfer
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12:30 |
O 63.6 |
XPD-Measurement of the Si/SiO2-interface on Si(110) — •Tobias Lühr, Daniel Weier, Frank Schönbohm, Sven Döring, Ulf Berges, and Carsten Westphal
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12:45 |
O 63.7 |
Interaction of as-grown InN(0001) surfaces with oxygen — •Anja Eisenhardt, Marcel Himmerlich, Juergen A. Schaefer, and Stefan Krischok
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