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Dresden 2009 – scientific programme

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O: Fachverband Oberflächenphysik

O 63: Semiconductor substrates: Adsorption

Friday, March 27, 2009, 11:15–13:00, SCH A118

11:15 O 63.1 Magnetic Molecules on GaN Studied by Low Temperature STM — •Kendal Clark, Danda Acharya, Violeta Iancu, Erdung Lu, Arthur Smith, and Saw-Wai Hla
11:30 O 63.2 Self assembled organic monolayers on silicon carbide — •Marco Hoeb, Ian D. Sharp, Carlos A. Diaz Alvarez, Sebastian Schoell, Martin Stutzmann, and Martin S. Brandt
11:45 O 63.3 Long-lived excitonic desorption of NO from C60/Cu(111)Tim Hoger and •Helmut Zacharias
12:00 O 63.4 STM study of the adsorption of coronene on Si(111)-(7x7) — •Jesus Martinez-Blanco, Max Klingsporn, and Karsten Horn
12:15 O 63.5 Site-selective reactivity of ethylene on hydrogen pre-covered Si(001) — •Gerson Mette, Michael Dürr, and Ulrich Höfer
12:30 O 63.6 XPD-Measurement of the Si/SiO2-interface on Si(110) — •Tobias Lühr, Daniel Weier, Frank Schönbohm, Sven Döring, Ulf Berges, and Carsten Westphal
12:45 O 63.7 Interaction of as-grown InN(0001) surfaces with oxygen — •Anja Eisenhardt, Marcel Himmerlich, Juergen A. Schaefer, and Stefan Krischok
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