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Dresden 2011 – scientific programme

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DS: Fachverband Dünne Schichten

DS 48: Ion Interactions with Nano Scale Materials III (Focused Session -- Organisers: Diesing, Facsko)

Thursday, March 17, 2011, 16:00–17:30, GER 37

16:00 DS 48.1 Topical Talk: Ion beam doping of semiconductor nanowires — •Carsten Ronning
16:30 DS 48.2 Structural investigations of ion beam doped silicon nanowires — •Jörg Grenzer, Olga D. Roshchupkina, Reinhard Kögler, Pratyush Das Kanungo, and Peter Werner
16:45 DS 48.3 Evolution of surface topography of Si(001) during ion beam erosion — •Martin Engler, Sven Macko, Frank Frost, and Thomas Michely
17:00 DS 48.4 Shadowing in metal assisted ion beam patterning on Si(001) — •Sven Macko, Martin Engler, Frank Frost, and Thomas Michely
17:15 DS 48.5 Nanohole Pattern Formation on Ge by Focused Ion Beam and Broad Beam — •Monika Fritzsche, Stefan Facsko, and Kilian Lenz
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