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Berlin 2012 – scientific programme

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MI: Fachverband Mikrosonden

MI 2: TEM- and SEM-based material analysis

Monday, March 26, 2012, 09:30–12:15, EMH 225

09:30 MI 2.1 Invited Talk: Chemical mapping at the atomic level using energy dispersive X-ray spectroscopyPeter Schlossmacher, •Bert Freitag, Dmitri Klenov, Adrian D Alfonso, and Les Allen
10:15 MI 2.2 Invited Talk: Physical foundations of electron diffraction methods in the scanning electron microscope — •Aimo Winkelmann
11:00 MI 2.3 Characterization of thin-film solar cells by means of various scanning electron microscopy methods — •Daniel Abou-Ras
11:15 MI 2.4 Aktuelle Ergebnisse mit den HRTEM JEOL JEM-ARM 200F — •Jürgen Heindl
11:30 MI 2.5 Chemical analysis between the mm and atomic scale using silicon drift detectors — •Meiken Falke, Ralf Terborg, Tobias Salge, Samuel Scheller, Daniel Goran, Ulrich Waldschläger, and Martin Rohde
11:45 MI 2.6 Characterization of novel capacitors for energy storage on the basis of 0-3 composites — •Jens Glenneberg, Alexandra Buchsteiner, Mandy Zenkner, Thomas Großmann, Claudia Erhardt, Stefan G. Ebbinghaus, Martin Diestelhorst, Sebastian Lemm, Wolfram Münchgesang, Horst Beige, Gerald Wagner, and Hartmut S. Leipner
12:00 MI 2.7 Oberflächenanalytik für die Untersuchung tribologischer Prozesse wie Verschleiß, Grenzschichtformierung und Schmierstoffdegradation molekularer Schmierstoffe mittels ToF-SIMS an realen tribologischen Systemen — •Ullrich Gunst
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