MI 2: TEM- and SEM-based material analysis
Montag, 26. März 2012, 09:30–12:15, EMH 225
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09:30 |
MI 2.1 |
Hauptvortrag:
Chemical mapping at the atomic level using energy dispersive X-ray spectroscopy — Peter Schlossmacher, •Bert Freitag, Dmitri Klenov, Adrian D Alfonso, and Les Allen
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10:15 |
MI 2.2 |
Hauptvortrag:
Physical foundations of electron diffraction methods in the scanning electron microscope — •Aimo Winkelmann
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11:00 |
MI 2.3 |
Characterization of thin-film solar cells by means of various scanning electron microscopy methods — •Daniel Abou-Ras
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11:15 |
MI 2.4 |
Aktuelle Ergebnisse mit den HRTEM JEOL JEM-ARM 200F — •Jürgen Heindl
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11:30 |
MI 2.5 |
Chemical analysis between the mm and atomic scale using silicon drift detectors — •Meiken Falke, Ralf Terborg, Tobias Salge, Samuel Scheller, Daniel Goran, Ulrich Waldschläger, and Martin Rohde
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11:45 |
MI 2.6 |
Characterization of novel capacitors for energy storage on the basis of 0-3 composites — •Jens Glenneberg, Alexandra Buchsteiner, Mandy Zenkner, Thomas Großmann, Claudia Erhardt, Stefan G. Ebbinghaus, Martin Diestelhorst, Sebastian Lemm, Wolfram Münchgesang, Horst Beige, Gerald Wagner, and Hartmut S. Leipner
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12:00 |
MI 2.7 |
Oberflächenanalytik für die Untersuchung tribologischer Prozesse wie Verschleiß, Grenzschichtformierung und Schmierstoffdegradation molekularer Schmierstoffe mittels ToF-SIMS an realen tribologischen Systemen — •Ullrich Gunst
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