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P: Fachverband Plasmaphysik

P 18: Poster: Plasmatechnologie

P 18.1: Poster

Donnerstag, 28. Februar 2013, 14:00–16:00, Poster EG

SiO₂ hollow spheres prepared by plasma deposition on polystyrene spheres and subsequent calcination — •John Meuthen¹, Lienhard Wegewitz^1,2, Oliver Höfft³, Alexandra Prowald³, Wolfgang Maus-Friedrichs^1,2, and Frank Endres³ — ¹Institut für Energieforschung und physikalische Technologien, TU Clausthal — ²Clausthaler Zentrum für Materialtechnik, TU Clausthal — ³Institut für Elektrochemie, TU Clausthal

Multilayer Polystyrene (PS) colloid crystals are exposed to a dielectric barrier discharge (DBD) in a mixture of Nitrogen and Silane as processing gas. This yields a closed layer of silicon nitride on the PS spheres. In a second step silicon nitride is oxidized to SiO₂ in an oxygen-DBD. Finally PS is calcinated leaving a colloid crystal of hollow SiO₂ spheres. The SiH₄-N₂ plasma treatment is applied at different gas pressures, especially atmospheric pressure and different times, respectively. So the thickness of the silicon nitride layer can be modulated. Furthermore, O₂ can be replaced by air, increasing the applicability of the process. For characterization and validation of each step mainly X-Ray Photoelectron Spectroscopy (XPS) and Atomic Force Microscopy (AFM) are used.