Jena 2013 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 18: Poster: Plasmatechnologie
P 18.1: Poster
Donnerstag, 28. Februar 2013, 14:00–16:00, Poster EG
SiO2 hollow spheres prepared by plasma deposition on polystyrene spheres and subsequent calcination — •John Meuthen1, Lienhard Wegewitz1,2, Oliver Höfft3, Alexandra Prowald3, Wolfgang Maus-Friedrichs1,2, and Frank Endres3 — 1Institut für Energieforschung und physikalische Technologien, TU Clausthal — 2Clausthaler Zentrum für Materialtechnik, TU Clausthal — 3Institut für Elektrochemie, TU Clausthal
Multilayer Polystyrene (PS) colloid crystals are exposed to a dielectric barrier discharge (DBD) in a mixture of Nitrogen and Silane as processing gas. This yields a closed layer of silicon nitride on the PS spheres. In a second step silicon nitride is oxidized to SiO2 in an oxygen-DBD. Finally PS is calcinated leaving a colloid crystal of hollow SiO2 spheres. The SiH4-N2 plasma treatment is applied at different gas pressures, especially atmospheric pressure and different times, respectively. So the thickness of the silicon nitride layer can be modulated. Furthermore, O2 can be replaced by air, increasing the applicability of the process. For characterization and validation of each step mainly X-Ray Photoelectron Spectroscopy (XPS) and Atomic Force Microscopy (AFM) are used.