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Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 13: Poster Session III: Layer properties: electrical, optical and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM; XPS, SIMS, RBS..)

DS 13.3: Poster

Monday, March 11, 2013, 17:00–20:00, Poster B1

Prozess characteristics and film properties upon doping of TiO2 by reactive serial co-sputtering utilizing high power impuls magnetron sputtering — •Rüdiger M. Schmidt1, Oliver Lenck2, Tomas Kubart3, Dominik Wagner1, Andreas Pflug2, Thomas Nyberg3, Sören Berg3, and Matthias Wuttig11I. Institute of Physics, RWTH Aachen University, Germany — 2Fraunhofer IST, Braunschweig, Germany — 3Solid State Electronics, The Ångström Laboratory, Uppsala University, Sweden

Titanium Dioxide (TiO2) is a material with attractive properties which have led to various applications such as anti-reflective coatings or self cleaning surfaces. High power impulse magneton sputtering (HiPIMS) is a PVD technique in which the power is applied to the target with low duty cycle (<10%) and frequenzy (<10 kHz) resulting in a high degree of ionization of the sputtered species. As a result, films deposited by HiPIMS show smooth surfaces and high densities. Unfortunatly the deposition of TiO2 using HiPIMS is hampered by significantly lower deposition rates compared to dcMS. Sputter Yield Amplification (SYA) can be used, through recoil of the sputtering species at implanted heavy dopants below the target surface, to increase deposition rates. We have built a designated sputter deposition tool which enables systematic studies of different dopants. In this study TiO2 is doped with Tungsten and Tantalum resulting in a rate increase of 250-400% and 180-320% respectively. Optical measurements in the visible range show that the absorption of TiO2:Ta is less than 0.5%, whereas TiO2:W shows a somewhat higher absorption.

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