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Dresden 2014 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 35: Poster I: Application of thin films; Focus session: Sensoric micro and nano-systems; Focus Session: Sustainable photovoltaics with earth abundant materials; Graphen (joint session with TT; MA; HL; DY; O); Ion and electron beam induced processes; Layer properties: electrical, optical, and mechanical properties; Magnetic/organic interfaces, spins in organics and molecular magnetism; Micro- and nanopatterning (jointly with O); Organic electronics and photovoltaics (jointly with CPP, HL, O); Thermoelectric materials

DS 35.55: Poster

Mittwoch, 2. April 2014, 17:00–20:00, P1

Evolution of nanostructures induced by low energy ion sputtering on Si surfaces — •Kun Zhang, Hans Hofsäss, and Omar Bobes — II. Physikalisches Institut, Universität Göttingen, Göttingen, Germany

In order to study the allotropic effect on ripple formation on silicon surfaces induced by ion-beam sputter erosion, three types of silicon materials, single crystalline silicon, amorphous silicon grown with evaporation and amorphous silicon produced with ion irradiation, were irradiated with 1-keV Ar+ ions at incidence angles from 30 to 87. The ion fluence was 2 x 1017 /cm2 for all irradiations. No ripples were formed for incidence angles smaller than 60 for all three materials, while perpendicular ripples occurred only in amorphous silicon at incidence angles between 82 and 85. The presented results show, that ripple formation is influenced by the underlying silicon material, which reveal different atom densities depending on the growth of the Si substrate material.

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