Berlin 2015 – scientific programme
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MM: Fachverband Metall- und Materialphysik
MM 14: Transport I: Diffusion
MM 14.5: Talk
Monday, March 16, 2015, 17:00–17:15, H 0107
Microstructure and Stress Relaxation in Thin Nano Crystalline Platinum Films — •Wolfgang Gruber1, Florian Strauß1, Lars Dörrer1, Michael Horisberger2, Thomas Geue2, Jochen Stahn2, Carsten Bähtz3, and Harald Schmidt1 — 1TU Clausthal, Institut für Metallurgie — 2Paul Scherrer Institut, Laboratory for Neutron Scattering — 3Helmholtz-Zentrum Dresden-Rossendorf, Institut für Ionenstrahlphysik und Materialforschung
Various techniques can be used to deposit thin metal films with a thickness in the nanometer range on a substrate. Independent of the method of production residual stress is present in the metal films after deposition. Based on the concept of dilatometry X-ray diffraction and X-ray reflectometry was used to investigate the correlation of strain relaxation and the change of point defect concentration in thin Pt films [1]. In the present work in-situ measurements using synchrotron radiation were performed in the temperature range between 100 °C and 300 °C to investigate strain relaxation in thin Pt films deposited on oxidised silicon substrates via magnetron sputtering and ion beam sputtering, respectively. Self-diffusion of Pt was investigated for samples produced by ion beam sputtering using secondary ion mass spectrometry and neutron reflectometry. The two systems are compared taking the microstructure as revealed by X-ray analysis into account.
W. Gruber, S. Chakravarty, C. Baehtz, W. Leitenberger, M. Bruns, A. Kobler, C. Kübel, H. Schmidt, Phys. Rev. Lett. 117 (2011) 265501.