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Regensburg 2016 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 34: Atomic Layer Deposition

DS 34.2: Vortrag

Mittwoch, 9. März 2016, 12:30–12:45, H8

Frontiers of Thin-Film Deposition: MAD-ALE growth and optical properties of Ruddlesden-Popper SrO(SrTiO3)n phase — •Fryderyk Lyzwa1, Premysl Marsik2, Vladimir Roddatis1, Markus Jungbauer1, Christian Bernhard2, and Vasily Moshnyaga11Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — 2Université de Fribourg, Département de Physique Chemin du Musée 3, 1700 Fribourg, Switzerland

As an unconventional method to deposit oxide films, Metalorganic Aerosol Deposition (MAD) shows an immense growth control up to submonolayer basis. The possiblities of MAD are presented by complex Ruddlesden-Popper (RP) n=4 films with the general formula SrO(SrTiO3)n in which perovskite layers of (SrTiO3)n are separated by single SrO layers. Those dielectrics are promising due to low-loss for microwave frequencies and could replace the well-studied system of BaSrTiO3.

The films were grown in atomic layer epitaxy (ALE) mode by sequential deposition of Sr-O/Ti-O2 atomic layers, monitored by optical in-situ ellipsometry, on SrTiO3(100) (unstrained), on LSAT(100) and on DyScO3(110). The RP structure was confirmed by x-ray diffraction and transmission electron microscopy. A 10nm-thick buffer enables an additional control nearby the substrate surface; it reduces significally the film roughness. Further we measured the infrared active phonon modes as a function of temperatureto in order to study the structure.

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