Regensburg 2016 – scientific programme

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DS: Fachverband Dünne Schichten

DS 34: Atomic Layer Deposition

DS 34.2: Talk

Wednesday, March 9, 2016, 12:30–12:45, H8

Frontiers of Thin-Film Deposition: MAD-ALE growth and optical properties of Ruddlesden-Popper SrO(SrTiO₃)_n phase — •Fryderyk Lyzwa¹, Premysl Marsik², Vladimir Roddatis¹, Markus Jungbauer¹, Christian Bernhard², and Vasily Moshnyaga¹ — ¹Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — ²Université de Fribourg, Département de Physique Chemin du Musée 3, 1700 Fribourg, Switzerland

As an unconventional method to deposit oxide films, Metalorganic Aerosol Deposition (MAD) shows an immense growth control up to submonolayer basis. The possiblities of MAD are presented by complex Ruddlesden-Popper (RP) n=4 films with the general formula SrO(SrTiO₃)_n in which perovskite layers of (SrTiO₃)_n are separated by single SrO layers. Those dielectrics are promising due to low-loss for microwave frequencies and could replace the well-studied system of BaSrTiO₃.

The films were grown in atomic layer epitaxy (ALE) mode by sequential deposition of Sr-O/Ti-O₂ atomic layers, monitored by optical in-situ ellipsometry, on SrTiO3(100) (unstrained), on LSAT(100) and on DyScO₃(110). The RP structure was confirmed by x-ray diffraction and transmission electron microscopy. A 10nm-thick buffer enables an additional control nearby the substrate surface; it reduces significally the film roughness. Further we measured the infrared active phonon modes as a function of temperatureto in order to study the structure.