Dresden 2017 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 13: Phase Change/Resistive Switching
DS 13.1: Vortrag
Montag, 20. März 2017, 15:00–15:15, CHE 91
Towards Shot Noise Study of Hafnium Oxide Resistive Switching — •Donato Civita1, 2, Carlos Sabater2, and Jan van Ruitenbeek2 — 1Institute of Chemistry, Graz, Austria — 2Leiden Institute of Physics, Leiden, The Netherlands
The continuous down-scaling of memory devices led to an increased interest in the Resistive Random Access Memory (ReRAM). Such a memory device consists of an ultrathin insulating layer between two metal electrodes where the insulating layer has the resistive switching (RS) properties, i.e. the ability to reversibly change its resistance as a result of an electrical stimulus. The switching mechanism is considered to be based on the formation and dissolution of a conducting filament surrounded by the insulating matrix. However, the nature of the conducting lament is still unclear.
In the present work, we design and produce novel RS nano-devices, consisting of hafnium oxide as insulating material and platinum as material for the metal electrodes. We describe in detail the fabrication procedure and characterization of the nano-devices and their RS behavior. A novel method to investigate the RS system, the Shot Noise measurement, is presented. The Shot Noise experiments will be presented together with the results of conductance measurements, with the goal to obtain insight into the nature of the conducting filaments.