Dresden 2017 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
MI: Fachverband Mikrosonden
MI 6: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)
Wednesday, March 22, 2017, 15:00–17:45, HSZ 02
 |
15:00 | MI 6.1 | Invited Talk: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren |
|
15:30 | MI 6.2 | Invited Talk: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis |
|
16:00 | MI 6.3 | Invited Talk: Directed self-assembly of performance materials — •Paul Nealey |
| 16:30 | 15 min. break | ||
|
16:45 | MI 6.4 | Invited Talk: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll |
|
17:15 | MI 6.5 | Invited Talk: High resolution 3D nanoimprint lithography — •Hartmut Hillmer |