Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
MI: Fachverband Mikrosonden
MI 6: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)
Mittwoch, 22. März 2017, 15:00–17:45, HSZ 02
 |
15:00 | MI 6.1 | Hauptvortrag: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren |
|
15:30 | MI 6.2 | Hauptvortrag: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis |
|
16:00 | MI 6.3 | Hauptvortrag: Directed self-assembly of performance materials — •Paul Nealey |
| 16:30 | 15 min. break | ||
|
16:45 | MI 6.4 | Hauptvortrag: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll |
|
17:15 | MI 6.5 | Hauptvortrag: High resolution 3D nanoimprint lithography — •Hartmut Hillmer |