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SYNS: Symposium Nanostructuring Beyond Conventional Lithography

SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)

SYNS 1.2: Hauptvortrag

Mittwoch, 22. März 2017, 15:30–16:00, HSZ 02

High precision fabrication for light management at nanoscale — •Saulius Juodkazis^1,2 and Armandas Balcytis¹ — ¹Swinburne University of Technology, Melbourne, Australia — ²Melbourne Center for Nanofabrication, Melbourne, Australia

For control of light-matter interactions occurring on molecular level we need to develop tools with nanoscale precision via nano-fabrication. Recent advances in high precision nanofabrication using 3D approaches and combining standard cleanroom tools with laser direct writing capabilities will be presented. Combination of electron beam lithography (EBL) with post-processing of nanoparticles with Ga-ion milling opens a possibility of sub-20 nm direct write of nano-inscriptions on nanoparticles. Arrays of identical chiral nanoparticles were fabricated with high fidelity and with uniform nano-features. Controlled resizing of ion-milled nanopores over the range of sizes from 100 nm to several nanometers in nano-membranes is achieved using electron beam scanning. Surface charging which is a common problem in applications of ion milling and electron imaging is resolved with co-illumination of deep UV light whose photons have energy larger than the electron work function for a given material. EBL and IBL can be both optimized for a high throughput for simple sample geometries. 3D laser fabrication of micro-optical elements and nano-textured surfaces adds new applications in lab-on-chip and sensing.