Dresden 2020 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 63: Focus: High-resolution Lithography and 3D Patterning (Part II) (joint session KFM/CPP/HL)

Donnerstag, 19. März 2020, 09:30–12:20, TOE 317

Chair: Robert Kirchner (TU Dresden)

	09:30	HL 63.1	Curvilinear Magnetism: Fabrication and characterization — •Denys Makarov
	09:50	HL 63.2	3D printing of complex submillimeter-sized wide angle objectives — •Zhen Wang, Ksenia Weber, Simon Thiele, Alois Herkommer, and Harald Giessen
	10:10	HL 63.3	Additive technology for X-ray optical applications — •Adam Kubec, Frieder Koch, and Christian David
	10:30	HL 63.4	Mass-producible microoptical elements by injection compression molding and focused ion beam structured titanium molding tools — •Simon Ristok, Marcel Röder, Simon Thiele, Mario Hentschel, Thomas Günther, André Zimmermann, Alois Herkommer, and Harald Gießen
	10:50		20 min. break
	11:10	HL 63.5	Hauptvortrag: 3D Printing with Electrons - Advances and Opportunities — •Harald Plank
	11:40	HL 63.6	Perfluorinated amidinate compounds for focused electron beam induced deposition (FEBID) — •Katarzyna Madajska and Iwona Szymańska
	12:00	HL 63.7	Synthetic strategies towards FEBID precursors — •Iwona Szymańska and Katarzyna Madajska