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O: Fachverband Oberflächenphysik
O 91: Poster Session - Semiconductor Substrates: Structure, Epitaxy and Growth
O 91.2: Poster
Mittwoch, 18. März 2020, 18:15–20:00, P2/1OG
Surface structure of MOVPE-prepared GaP(111)B — •Peter Kleinschmidt1, Pingo Mutombo2, Theresa Berthold1,3, Agnieszka Paszuk1, Matthias Steidl1, Gernot Ecke4, Andreas Nägelein1, Christian Koppka1,3, Oliver Supplie1, Stefan Krischok1,3, Oleksandr Romanyuk2, Marcel Himmerlich1,3,5, and Thomas Hannappel1 — 1Institut für Physik, Technische Universität Ilmenau PF 100565, 98684 Ilmenau — 2Institute of Physics of the Czech Academy of Sciences, Cukrovarnická 10, 16200 Prague, Czech Republic — 3Institut für Mikro- und Nanotechnologien, Technische Universität Ilmenau, PF 100565, 98684 Ilmenau, Germany — 4Institut für Mikro- und Nanoelektronik, Technische Universität Ilmenau, PF 100565, 98684 Ilmenau, Germany — 5European Organization for Nuclear Research - CERN, 1211 Meyrin, Switzerland
The MOVPE-prepared GaP(111)B surface was studied by XPS, STM, LEED, AES and AFM as well as ab initio DFT. Deoxidation under TBP, followed by high-temperature annealing under pure hydrogen results in the formation of Ga-rich islands, whereas the regions in between are atomically flat. Atomically resolved STM of these regions shows a largely disordered surface, but small units of (2 × 2), c(4 × 2), and ( 3 × 3)R30∘ordering can be identified. According to DFT calculations, these are the most favorable reconstructions under hydrogen-rich conditions. We conclude that STM images the dangling bonds of an otherwise hydrogen-terminated phosphorus face.