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MM: Fachverband Metall- und Materialphysik

MM 12: Poster I

MM 12.1: Poster

Monday, March 27, 2023, 18:15–20:00, P2/OG1+2

Time-of-Flight X-ray Photoelectron Microscopy (ToF-X-PEEM) — •G. Schönhense¹, O. Tkach^1,2, O. Fedchenko¹, Y. Lytvynenko¹, D. Vasilyev¹, Q.L. Nguyen³, T.R.F. Peixoto⁴, A. Gloskovskii⁴, S. Chernov⁴, M. Hoesch⁴, N. Wind^4,5, M. Heber⁴, C. Schlueter⁴, C. Sharma⁵, K. Rossnagel^4,5, M. Scholz⁴, and H.-J. Elmers¹ — ¹Mainz Univ. — ²Sumy State Univ. — ³SLAC Nat. Accel. Lab., USA — ⁴DESY Hamburg — ⁵Kiel Univ.

The classical solution for photoelectron imaging in the X-ray range (X-PEEM) employs a hemispherical analyzer, as first described by Tonner1. X-PEEM shows reduced spatial and energy resolution and notoriously low transmission, a consequence of the slits and small angular acceptance of the hemisphere. ToF-X-PEEM combines time-of-flight energy recording with a new lens optics minimizing spherical aberration. Systematic ray tracings predict a resolution in the (sub-) micron range, when a k-confining aperture array is placed in the second reciprocal plane, where the k-magnification can be zoomed in a large range. The new optics has been recently commissioned at PETRA-III (soft X-rays), studying ultrathin flakes and Moiré sandwich patterns of various transition-metal dichalcogenides. We demonstrate the high quality of deposited flakes by systematic ToF-X-PEEM characterization. Imaging large field of view >3mm with widened X-ray beam profile enables rapid chemical mapping with frame rates up to 1/s for strong core levels. Contracting the beam spot to <20mu and placing it on the desired flake allows small-area SX-ARPES employing the momentum-microscopy mode. [1] B.Tonner, NIMS A291, 60(1990)