Berlin 2024 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
O: Fachverband Oberflächenphysik
O 31: Poster: Organic Molecules on Inorganic Substrates
O 31.7: Poster
Tuesday, March 19, 2024, 18:00–20:00, Poster C
N-Heterocyclic carbenes and olefins on silicon — •Robert Zielinski1,5, Sandhya Chandola3, Maximilian Koy4, Hazem Aldahhak2, Mowpriya Das4, Matthias Freitag4, Uwe Gerstmann2, Mike T. Nehring1, Denise Liebig1, Adrian K. Hoffmann1, Canan Kosbab1, Max Rosin1, Simone Brozzesi7, Ankita Das4, Viktoria Balfanz1, Juls Brühne1, Wolf Gero Schmidt2, Conor Hogan6,7, Mario Dähne1, Frank Glorius4, Norbert Esser1,5, and Martin Franz1 — 1Institut für Festkörperphysik, Technische Universität Berlin, Germany — 2Lehrstuhl für Theoretische Materialphysik, Universität Paderborn, Germany — 3Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, Germany — 4Organisch-Chemisches Institut, Westfälische Wilhelms-Universität Münster, Germany — 5Leibniz-Institut für Analytische Wissenschaften - ISAS e.V., Berlin, Germany — 6Istituto di Struttura della Materia-CNR (ISM-CNR), Rome, Italy — 7Department of Physics, Università di Roma "Tor Vergata", Italy
N-Heterocyclic carbenes and olefins are known to be excellent modifiers and anchors for the functionalization of surfaces. Here their adsorption behavior on Si(111) is investigated using scanning tunneling microscopy, X-ray photoelectron spectroscopy, and density functional theory. Covalently bound monolayers with high thermal stability and large work function reductions are found. The adsorption geometry and ordering behavior depend on the specific molecule and the domains size correlates with the defect density of the substrate.
Keywords: N-Heterocyclic carbenes; N-Heterocyclic olefins; silicon; scanning tunneling microscopy; photoelectron spectroscopy