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O: Fachverband Oberflächenphysik

O 31: Poster: Organic Molecules on Inorganic Substrates

O 31.7: Poster

Dienstag, 19. März 2024, 18:00–20:00, Poster C

N-Heterocyclic carbenes and olefins on silicon — •Robert Zielinski^1,5, Sandhya Chandola³, Maximilian Koy⁴, Hazem Aldahhak², Mowpriya Das⁴, Matthias Freitag⁴, Uwe Gerstmann², Mike T. Nehring¹, Denise Liebig¹, Adrian K. Hoffmann¹, Canan Kosbab¹, Max Rosin¹, Simone Brozzesi⁷, Ankita Das⁴, Viktoria Balfanz¹, Juls Brühne¹, Wolf Gero Schmidt², Conor Hogan^6,7, Mario Dähne¹, Frank Glorius⁴, Norbert Esser^1,5, and Martin Franz¹ — ¹Institut für Festkörperphysik, Technische Universität Berlin, Germany — ²Lehrstuhl für Theoretische Materialphysik, Universität Paderborn, Germany — ³Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, Germany — ⁴Organisch-Chemisches Institut, Westfälische Wilhelms-Universität Münster, Germany — ⁵Leibniz-Institut für Analytische Wissenschaften - ISAS e.V., Berlin, Germany — ⁶Istituto di Struttura della Materia-CNR (ISM-CNR), Rome, Italy — ⁷Department of Physics, Università di Roma "Tor Vergata", Italy

N-Heterocyclic carbenes and olefins are known to be excellent modifiers and anchors for the functionalization of surfaces. Here their adsorption behavior on Si(111) is investigated using scanning tunneling microscopy, X-ray photoelectron spectroscopy, and density functional theory. Covalently bound monolayers with high thermal stability and large work function reductions are found. The adsorption geometry and ordering behavior depend on the specific molecule and the domains size correlates with the defect density of the substrate.

Keywords: N-Heterocyclic carbenes; N-Heterocyclic olefins; silicon; scanning tunneling microscopy; photoelectron spectroscopy